Conference Focuses on Cleanliness Concepts and Standards

Technical Cleanliness Expert Day on Sept. 25 focused on technical cleanliness concepts and establishing production and assembly cleanliness standards. 

When a supplier company is required to reach stringent cleanliness standards with certain parts it produces for its customers, it can be challenging to discover the most efficient cleaning technique to achieve these standards. To help quality engineers, manufacturing engineers, metallurgists, project engineers and supply chain/purchasing engineers who need to assure cleanliness standards, Glaser Inc. and Jomesa North America Inc. presented a Technical Cleanliness Expert Day at the Bertram Inn and Conference Center in Aurora, Ohio, on Sept. 25, to 39 registered participants.

Markus Rossler, V.P. of Glaser Inc. opened the conference with his presentation, “Industrial Standard ISO16232, Version 2018,” where he thoroughly explained this technical cleanliness standard, the differences between the new version versus the 2007 version as well as how the VDA 19.1 standard is different from the ISO standard. Later in the day, Mr. Rossler also presented “Concepts to Improve Production/Assembly Cleanliness Levels (in accordance with VDA 19.2),” where he explained how to design a clean assembly facility, from maintaining a clean environment to logistics and staff cooperation. His final presentation covered new cleanliness requirements due to emerging electromobility.

Peter Feamster, product management director, Jomesa, described “Automated Microscope Analysis” during his presentation. He explained the types of microscopes available, recognizing particles found by cleanliness analysis microscopes, measuring these particles, categorization, reviewing particles and documentation.

Scanning electron microscopy with energy dispersive X-ray spectroscopy (SEM/EDX) was explained to the attendees by Ben Abraham, manager – material science, Gateway Analytical, in his presentation, “Detailed Material Analysis.” He described the techniques for monitoring cleanliness and the benefits of automated SEM/EDX.

Component cleanliness from an industry perspective was the focus of Lev Pekarsky’s presentation, “Technical Cleanliness Concepts for Supply Chain Management.” Mr. Pekarsky is a technical expert – contamination and filtration, with Ford Motor Co. He described the evolution of production contamination inspection and the Ford engineering specification for components washing.

John Irvin, manufacturing project engineer, Caterpillar Inc., presented “Contamination Control at Caterpillar.” He explained the root causes of contamination at his company and the benchmarking guide he uses that establishes standard expectations for contamination control. He talked about airborne contamination, assembly processes, cleanliness validation, component storage, handling and protection and other aspects of Caterpillar’s cleanliness management, including specifications and challenges he faces in the field.

The “Top 5 Chemistry Concepts for Cleaning,” was presented by Darren Williams Ph.D., professor of chemistry at Sam Houston State University. He thoroughly explained what surface, soil, solvent, safety and sustainability have to do with sufficient parts cleaning. He also talked about how contact angle is related to cleanliness. He provided attendees with many links to resources to find more information about each of these concepts.

The conference ended with a Big Data podium discussion: Can cleanliness testing data evaluation and compilation benefits the automotive industry along the supply chain?

If you missed this year’s Technical Cleanliness Expert Day, be sure to check out the Parts Cleaning Conference at PMTS 2019, April 3-4, at the Huntington Convention Center in Cleveland, Ohio. The conference will feature a line-up of technical experts that will review everything from applications and best practices to chemistry and environmental regulations.

Also, revisit Production Machining’s website for information on the next Technical Cleanliness Expert Day.